Micron Technology holds groundbreaking ceremony in Hiroshima

Micron Technology holds groundbreaking ceremony in Hiroshima

US semiconductor giant Micron Technology has started expansion work at its factory in Hiroshima Prefecture, aimed at mass-producing cutting-edge semiconductors for generative AI and other applications. A groundbreaking ceremony was held on Saturday.

Micron currently produces DRAM memory semiconductors at its factory in Higashihiroshima City.

According to the Ministry of Economy, Trade and Industry, the company plans to mass-produce cutting-edge semiconductors for use in generative AI and other applications, and will invest approximately 1.5 trillion yen, or about 9.3 billion dollars, in factory expansion and related work. The ministry will provide up to 536 billion yen, or about 3.3 billion dollars, in subsidies.

In his address at the groundbreaking ceremony on Saturday, Industry Minister Akazawa Ryosei stated that semiconductors not only support the realization of DX and GX, but are also extremely important strategic materials from the perspective of economic security.

Micron says construction of the plant's facilities will proceed in phases, with the installation of semiconductor manufacturing equipment scheduled to begin in the second half of 2028.

Akazawa said after the ceremony that "Demand for semiconductors is expected to grow rapidly as we enter the age of AI."

He added, "It is extremely important to establish a domestic manufacturing base for semiconductors, including DRAM, and to ensure a stable supply system."